슬랏 안테나 두께에 따른 원통형 TE11 선형 마이크로웨이브 플라즈마 특성 분석 (Electron Distribution of Cylindrical TE11 Wave Guide Type Linear Microwave Plasma Source according to Slot Antenna Thickness)

서지정보

· 발행기관 : 대한전기학회
· 수록지 정보 : 전기학회논문지 / 72권 / 12호 / 1670 ~ 1677페이지
· 저자명 : 차주홍, 김상우, 정성현, 이호준

초록

For the purpose of concentrating the plasma density in the deposition area, linear microwave plasma source which is based on circular TE11 wave mode has been developed. As the shape of a circular waveguide, it is filled with high permittivity dielectric.
Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical slotted line antenna. It shows that the electron density in the deposition area is higher than that of the conventional quasi coaxial TEM plasma sources. However, due to the short wavelength compared to the equipment size, it has a non-uniform electric field distribution. In order to improve the uniformity problem, this research conducted the 3-D fluid model analysis based on linear microwave plasma source using Ar gas along the slot antenna thickness and process pressure. It was observed that the spatial uniformity of electron increases when the slot antenna thickness is optimized to 3mm, and the power transfer rate to the plasma is increased at 300mTorr.

영어초록

For the purpose of concentrating the plasma density in the deposition area, linear microwave plasma source which is based on circular TE11 wave mode has been developed. As the shape of a circular waveguide, it is filled with high permittivity dielectric.
Microwave power at 2.45 GHz is transferred to the plasma through the continuous cylindrical slotted line antenna. It shows that the electron density in the deposition area is higher than that of the conventional quasi coaxial TEM plasma sources. However, due to the short wavelength compared to the equipment size, it has a non-uniform electric field distribution. In order to improve the uniformity problem, this research conducted the 3-D fluid model analysis based on linear microwave plasma source using Ar gas along the slot antenna thickness and process pressure. It was observed that the spatial uniformity of electron increases when the slot antenna thickness is optimized to 3mm, and the power transfer rate to the plasma is increased at 300mTorr.

참고자료

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