레이저 유도 전사를 이용한 유연기판의 액체금속 미세 패터닝 (Micro-Patterning of Liquid Metal on Flexible Substrate Using Laser Induced-Forward Transfer)

서지정보

· 발행기관 : 한국정밀공학회
· 수록지 정보 : 한국정밀공학회지 / 40권 / 2호 / 157 ~ 162페이지
· 저자명 : 조민제, 지석영, 조정호, 장원석

초록

We have developed a direct conductive patterning method with micro-scale line widths using the laser-induced-forward transfer (LIFT) and liquid metal. As this method does not need post-thermal processing, there is no thermal damage even on heat-sensitive polymer substrates by low-power laser irradiation on the dynamic release layer (DRL). Unlike other liquid metal patterning processes, this procedure can easily achieve fine line widths of a few tens of micrometers corresponding to laser spot size. The solid-state UV pulse laser with 266 nm wavelength and 20 ns pulse duration was used to transfer Eutectic Gallium Indium (EGaIn) liquid metal and the results for the single and multi-pulse laser irradiation were investigated to determine the effective process conditions. The applicability of flexible circuit fabrication and selective circuit repair was successfully tested on Polyimide (PI) substrate. After the LIFT process, the electrical properties of liquid metal on the pattern were measured to be approximately 5~8 x 10-3 Ω/m of resistance.

영어초록

We have developed a direct conductive patterning method with micro-scale line widths using the laser-induced-forward transfer (LIFT) and liquid metal. As this method does not need post-thermal processing, there is no thermal damage even on heat-sensitive polymer substrates by low-power laser irradiation on the dynamic release layer (DRL). Unlike other liquid metal patterning processes, this procedure can easily achieve fine line widths of a few tens of micrometers corresponding to laser spot size. The solid-state UV pulse laser with 266 nm wavelength and 20 ns pulse duration was used to transfer Eutectic Gallium Indium (EGaIn) liquid metal and the results for the single and multi-pulse laser irradiation were investigated to determine the effective process conditions. The applicability of flexible circuit fabrication and selective circuit repair was successfully tested on Polyimide (PI) substrate. After the LIFT process, the electrical properties of liquid metal on the pattern were measured to be approximately 5~8 x 10-3 Ω/m of resistance.

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