Adaptive DeadBand를 애용한 반도체공정 제어
(주)코리아스칼라
- 최초 등록일
- 2016.04.02
- 최종 저작일
- 2005.12
- 19페이지/ 어도비 PDF
- 가격 5,400원
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서지정보
ㆍ발행기관 : 대한안전경영과학회
ㆍ수록지정보 : 대한안전경영과학회지 / 7권 / 5호
ㆍ저자명 : 김준석, 고효헌, 김성식
영어 초록
Overlay parameter control of the semiconductor photolithography process is researched in this paper. Overlay parameters denote the error in superposing the current pattern to the pattern previously created. The reduction of the overlay deviation is one of the key factors in improving the quality of the semiconductor products. The semiconductor process is affected by numerous environment and equipment factors. Through process condition prediction and control, the overlay inaccuracy can be reduced. Generally, three types of process condition change exist; uncontrollable white noise, slowly changing drift, and abrupt condition shift. To effectively control the aforementioned process changes, control scheme using adaptive deadband is proposed. The suggested approach and existing control method are cross evaluated through simulation.
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