an operate with wafers on a horizontal conveyor belt. Deposition rate is fast and at low ... ueposition rate at relatively low temperatures. Step coverage is good. PE CVD structureALD (Atomic ... Layer Deposition) ★ Relatively new as a commercially available technique, ALD utilizes sequential
Reactor SystemCost Substrates, enzyme, labor, depreciation, overheads and process development Building and ... ubstrate inhibition on the variation of conversion with flow rate in PBR(——) and CSTR (--------) for ... substrate to be used Enzyme : IGI / Substrate : Glucose syrup Type of reactor PBR Operation c