Dip-pen nanolithography를 위한 이중 팁을 가진 질화규소 프로브의 설계 및 제조 (Design and Fabrication of Dual Tip Si3N4 Probe for Dip-pen Nanolithograpy)

서지정보

· 발행기관 : 한국표면공학회
· 수록지 정보 : 한국표면공학회지 / 47권 / 6호 / 362 ~ 367페이지
· 저자명 : 김경호, 한윤수

초록

We report the design, fabrication of a Si3N4 probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress Si3N4 material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.

영어초록

We report the design, fabrication of a Si3N4 probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress Si3N4 material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.

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