대류성 자기조립법을 통한 폴리스티렌 비드 대면적 단일층 형성에 미치는 공정 변수 효과
(주)코리아스칼라
- 최초 등록일
- 2016.04.02
- 최종 저작일
- 2015.12
- 8페이지/ 어도비 PDF
- 가격 4,000원
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서지정보
ㆍ발행기관 : 한국재료학회
ㆍ수록지정보 : 한국재료학회지 / 25권 / 12호
ㆍ저자명 : 서안나, 최지환, 변재철, 김원목, 김인호, 이경석
목차
1. 서 론
2. 이론적 배경
3. 실험 방법
4. 결과 및 고찰
5. 결 론
Acknowledgement
References
영어 초록
Self-assembled monolayers(SAM) of microspheres such as silica and polystyrene(PS) beads have found widespread application in photonic crystals, sensors, and lithographic masks or templates. From a practical viewpoint, setting up a highthroughput process to form a SAM over large areas in a controllable manner is a key challenging issue. Various methods have been suggested including drop casting, spin coating, Langmuir Blodgett, and convective self-assembly(CSA) techniques. Among these, the CSA method has recently attracted attention due to its potential scalability to an automated high-throughput process. By controlling various parameters, this process can be precisely tuned to achieve well-ordered arrays of microspheres. In this study, using a restricted meniscus CSA method, we systematically investigate the effect of the processing parameters on the formation of large area self-assembled monolayers of PS beads. A way to provide hydrophilicity, a prerequisite for a CSA, to the surface of a hydrophobic photoresist layer, is presented in order to apply the SAM of the PS beads as a mask for photonic nanojet lithography.
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