반도체 소자 및 설계
- 최초 등록일
- 2019.06.08
- 최종 저작일
- 2019.03
- 15페이지/ MS 파워포인트
- 가격 1,000원
목차
1. Metal & Semiconductor & Insulator
2. Register & Inductor & Capacitor
3. Silicon Wafers Manufacturing
4. Czochralski Crystal Growth
5. Diffusion
6. Two-Step Diffusion
7. Ion Implantation
8. Comparison of Diffusion & Ion Implantation
9. Lithography
10. Photolithographic Process
11. Lithography
본문내용
Lithography
• A patterning process to transfer the designed pattern from the mask or reticle to the photoresist on the wafer surface.
• Masks contain the patterns of windows which are transferred to the surface of the silicon wafer
<중 략>
Lithography
•Positive lithography : the pattern printed on the wafer surface has the same image as the pattern on the mask.
• Negative lithography : photoresist will become insoluble and harden by cross linking when exposed to light. The cross-linked resist cannot be washed away in solvents.
참고 자료
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