Si3N4/ Ti와 Si3N4/ TiAl합금의 계면반응 및 확산 거동

서지정보

ㆍ발행기관 : 한국재료학회 ㆍ수록지정보 : 한국재료학회지 / 27권 / 11호
ㆍ저자명 : 최광수, 김선진, 이지은, 박준식, 이종원

영어 초록

Si3N4 is a ceramic material attracting attention in many fields because of its excellent abrasion resistance. In addition, Ti and TiAl alloys are metals used in a variety of high temperature environments, and have attracted much attention because of their high strength and high melting points. Therefore, study of the interface reaction between Si3N4 / Ti and Si3N4 / TiAl can be a useful practice to identify phase selection and diffusion control. In this study, Si3N4 / Ti5Si3 + TiN / TiN / Ti diffusing pairs were formed in the Si3N4 / Ti interfacial reaction and Si3N4 / TiN(Al) / Ti3Al / TiAl diffusion pathway was identified in the Si3N4 / TiAl interfacial reaction. The diffusion layers of the interface reactions were identified and, to investigate the kinetics of the diffusion layer, the integrated diffusion coefficients were estimated.

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