인쇄 제판용 Photoresist의 합성과 G.S법에 의한 감광특성 비교;인쇄 제판용 Photoresist의 연구[II]
(주)코리아스칼라
- 최초 등록일
- 2016.04.02
- 최종 저작일
- 1997.08
- 8페이지/ 어도비 PDF
- 가격 4,000원
* 본 문서는 배포용으로 복사 및 편집이 불가합니다.
서지정보
ㆍ발행기관 : 한국유화학회
ㆍ수록지정보 : 韓國油化學會誌 / 14권 / 2호
ㆍ저자명 : 이기창
영어 초록
Naphthoquinone-1,2-diazide-5-sulfonyl [NDS]derivatives members of Quinone diazide compound that are utilizable as photoresist for printing plate were synthesized, and photoresist were prepared by mixing these derivatives with a matrix resin(PF, CF) at various weight ratios. Photosensitive characteristics of photoresist were studied by Gray scale method, and SEM to analyze if they can be used as photosensitive material in a printing plate. Experimental results showed using IR, UV, NDS derivatives were photoconverted and developer-soluble photoresist were produced. Photoresist in the mixing ratio of 1:4 of NDS[II] and CF resin gave rise to the highest dissolution rate. In addition, photoresist obtained at this condition resulted in the most superior sensitivity.
참고 자료
없음
"韓國油化學會誌"의 다른 논문
더보기 (5/10)